硼掺杂单层MoSi2N4锂离子吸附与扩散行为的第一性原理研究 |
First-Principles Study of Adsorption and Diffusion Behaviors of Li-Ion on Boron-Doped MoSi2N4 Monolayer |
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摘要: 采用平面波超软赝势方法研究了硼掺杂单层MoSi2N4的锂离子吸附与扩散行为。建立了替换位、间隙位、吸附位硼掺杂单层MoSi2N4三类物理模型(共6种构型)。结果表明:硼原子替换表面氮原子的构型最为稳定,该构型下的锂离子吸附能在-1.540~-1.910 eV之间。通过分析电子密度差分图,可知硼掺杂引起MoSi2N4表面的电荷重新分布,即硼与氮获得了来自锂离子的电子转移,导致锂离子在其表面吸附能增加。比较锂离子在硼掺杂MoSi2N4表面的吸附能,推断其扩散路径为D→F,扩散势垒为0.077 eV,表明锂离子在该表面具有较高的脱嵌速率。 |
关键词: 锂离子电池 第一性原理 二维材料 |
基金项目: 国家自然科学基金(No.51472081)资助。 |
Abstract: The adsorption and diffusion behaviors of Li-ion on boron-doped MoSi2N4 monolayer were studied by ultrasoft pseudopotential plane-wave method. We established three physical models:substitution sites, interstitial sites and adsorption sites of boron-doped MoSi2N4 monolayer, including six doped configurations. The results show that boron substitution for nitrogen on the surface is the most stable, and the adsorption energy of Li-ion on the configuration is between -1.540 and -1.910 eV. The charge density difference diagram indicates that both boron and nitrogen on the surface accept part of electrons from the Li-ion, which leads to the enhancement of adsorption energy. According to the potential energy difference of Li-ion adsorption on the surface of boron-doped MoSi2N4, it concludes that the diffusion pathway is D→F and the corresponding diffusion barrier is 0.077 eV, it is confirmed that the Li-ion has high extraction-insertion rate on the surface of boron-doped MoSi2N4 monolayer. |
Keywords: Li-ion battery first-principles 2D materials |
投稿时间:2021-05-21 修订日期:2021-08-26 |
摘要点击次数: 1955 |
全文下载次数: 879 |
程悦桓,马新国,黄楚云,廖家俊,段汪洋.硼掺杂单层MoSi2N4锂离子吸附与扩散行为的第一性原理研究[J].无机化学学报,2021,37(12):2167-2174. |
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