| 不同基底对TiO2和SiO2薄膜的光学性能的影响 |
| Effects of Different Substrates on the Optical Properties of TiO2 and SiO2 Films |
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| 摘要: 采用溶胶-凝胶法分别在K9玻璃、单晶硅和石英玻璃基底上制备了纳米TiO2和SiO2薄膜。利用SEM、UV-Vis及反射式椭圆偏振光谱仪对薄膜的微观结构及光学特性进行了表征和分析。结果表明:3种基底中, 单晶硅基底上TiO2和SiO2薄膜折射率最大;在非晶态K9玻璃和石英玻璃基底上TiO2薄膜折射率和透光率差异较大;SiO2薄膜在非晶态基底上折射率、透光率相近;3种基底上薄膜的折射率和消光系数都有随波长增大而减小的趋势, 同时Cauchy模型能较好的描述单晶硅基底上两种薄膜在400~800 nm波段的光学性能。 |
| 关键词: 溶胶-凝胶 椭偏仪 基底 光学常数 微结构 |
| 基金项目: 天津市薄膜光学重点实验室开放基金(No.JHWX130492)资助项目。 |
| Abstract: TiO2 and SiO2 thin films were respectively deposited on K9 glass, monocrystalline silicon and quartz glass substrates by using the sol-gel method. The surface morphology and optical properties of the films were characterized by SEM, UV-Vis and spectroscopic ellipsometer. Among the three substrates, on the monocrystalline silicon substrate TiO2 and SiO2 thin films have the largest refractive index; On the amorphous K9 glass and quartz glass substrate, refractive index and light transmittance of TiO2 film are quite different; On the amorphous substrate, refractive index and light transmittance of SiO2 are similar; SiO2 and TiO2 film have a law that with increased the number of wavelength, the refractive index and extinction coefficient reduced; Cauchy model could describe optical properties of films very on the silicon substrate well in 300~700 nm waveband. |
| Keywords: sol-gel spectroscopic ellipometry substrate optical constants microstructure |
| 投稿时间：2014-11-20 修订日期：2015-04-24 |
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| 杨宁宁,雅菁,胡凤娇,郭晓霖.不同基底对TiO2和SiO2薄膜的光学性能的影响[J].无机化学学报,2015,31(7):1315-1320. |
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