无机化学学报

基于电解液微弧放电的碳氮化钛厚膜形成机理分析

Growth Mechanism for Ti(C_xN_1-x) Thick Films Prepared by Plasma Electrolytic Carbonitriding

作者	单位
李新梅	新疆大学机械工程学院机械工程博士后科研流动站，乌鲁木齐 830047
孙文磊	新疆大学机械工程学院机械工程博士后科研流动站，乌鲁木齐 830047
憨　勇	西安交通大学金属材料强度国家重点实验室，西安 710049
刘　炳	新疆大学机械工程学院机械工程博士后科研流动站，乌鲁木齐 830047
孙耀宁	新疆大学机械工程学院机械工程博士后科研流动站，乌鲁木齐 830047

摘要: 采用电解液微弧碳氮化技术(PECN)，在钛合金表面沉积出较厚的Ti(C_xN_1-x)膜层，用红外光谱研究了改性过程中的气封组成，分析了膜层的形成机理。结果表明：PECN处理过程中的气相产物主要是：CH₄、NH₃、C₂H₂、CO、CO₂和H₂O。各气体产物来自于PECN处理过程中有机物的分解，并且气体之间存在相互作用。随放电时间延长，各气体浓度呈现不同的变化趋势，导致气封中碳、氮势随之改变，继而引起Ti(C_xN_1-x)膜层中C/N原子比亦相应变化。PECN过程大致可分为：阴极电解析氢、有机物的热分解以形成气封，反应气体在等离子体的作用下分解、电离产生含碳、氮活性粒子，活性粒子向试样表面扩散，在试样表面吸附并发生化学反应形成Ti(C_xN_1-x)膜。

关键词: 电解液微弧碳氮化 Ti(C_xN_1-x)膜红外光谱形成机理

基金项目:

Abstract: Ti(C_xN_1-x) thick films were obtained on Ti₆A₁₄V substrate by plasma electrolytic carbonitriding(PECN). The vapor envelope compositon in PECN was investigated by IR, and the growth mechanism of the Ti(C_xN_1-x) films was analyzed. The results show that the gas products in PECN are mainly composed of CH₄, NH₃, C₂H₂, CO, CO₂ and H₂O. The gas products are derived from the decomposition of the organic solvent and there is an interaction between gases. With the extension of the discharge time, the carbon and nitrogen potential in vapor envelope change with the variations of the gases concentrations, so do the ratios of C/N of Ti(C_xN_1-x) films. The Ti(C_xN_1-x) film grows as a result of the following stages during PECN process: (ⅰ) the formation of the vapor envelope due to the liberation of gaseous hydrogen and the decomposition of organic solvent, (ⅱ) the dissociation and ionization of gas products under the action of plasma to produce active carbon- and nitrogen-containing radicals, (ⅲ) the diffusion of active carbon- and nitrogen-containing radicals into the titanium under the action of strong electric field, (ⅳ) the absorption of active species and the reaction of the active species with the titanium surface to promote the formation of the Ti(C_xN_1-x) film.

Keywords: plasma electrolytic carbonitriding Ti(C_xN_1-x)film infrared spectroscopy growth mechanism

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李新梅,孙文磊,憨　勇,刘　炳,孙耀宁.基于电解液微弧放电的碳氮化钛厚膜形成机理分析[J].无机化学学报,2010,26(6):1049-1055.

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