通过硅烷偶联剂在硅和铟锡氧化物(ITO)表面嫁接寡聚芴分子 |
Covalent Attachment of Oligofluorenes onto Si and Indium Tin Oxide(ITO) Substrates by Grafting with Organosilanes |
|
摘要: 通过硅烷偶联剂γ-氨丙基三乙氧基硅烷(3-aminopropyl-triethoxysilane,APTES)的“分子桥梁”作用,采用两种不同的方法,把修饰后的寡聚芴分子键联到硅表面和铟锡氧化物(ITO)表面上。X射线光电子能谱(XPS)、原子力显微镜(AFM)和循环伏安(CV)方法等的表征证实了通过硅烷偶联剂在硅表面和ITO表面嫁接寡聚芴分子可行性。 |
关键词: 硅 铟锡氧化物 硅烷偶联剂 寡聚芴分子 嫁接 |
基金项目: |
Abstract: Two methods of introducing oligofluorenes onto Si and indium tin oxides(ITO) substrates by grafting with organosilane are presented. The organosilane, 3-aminopropyltriethoxysilane(APTES), was used as molecular bridge to link oligofluorenes onto silicon and ITO substrates. Such substrate-based oligofluorenes films were investigated by X-ray photoelectron spectroscopy(XPS), AFM, and electrochemical analysis. All results prove that oligofluorenes immobilization on silicon and ITO substrates through orgaosilane molecular bridge is feasible. |
Keywords: silicon indium tin oxide organosilanes immobilization |
|
摘要点击次数: 1341 |
全文下载次数: 3135 |
段 瑜,温贵安,许国勤,黄 维.通过硅烷偶联剂在硅和铟锡氧化物(ITO)表面嫁接寡聚芴分子[J].无机化学学报,2008,24(10):1596-1603. |
查看全文 查看/发表评论 下载PDF阅读器 |
Support information: |
|
|
|