聚喹啉/杂多阴离子杂化LB膜的制备与光电性质
Preparation and Photoelectric Properties of Hybrid Polyquinolin/Heteropolyanion LB Films
作者单位
靳素荣 武汉理工大学材料复合新技术国家重点实验室武汉 430070 
柳士忠 湖北大学化学与材料学院武汉 430062 
张联盟 武汉理工大学材料复合新技术国家重点实验室武汉 430070 
杜祖亮 河南大学固体表面实验室开封 475000 
赵卫锋 武汉理工大学材料复合新技术国家重点实验室武汉 430070 
摘要: 
关键词: 聚喹啉 三缺位九钨硅杂多阴离子 Langmuir膜与LB膜 光电性质
基金项目: 
Abstract: LB film of new hybrid Polyquinolin/Trilacunary heteropolytungstoilicate (PQ/SiW9) was prepared and characterized by π-A isotherm, UV-Vis absorption spectroscopy, atomic force microscope(AFM), fluorescence spectroscopy. The results indicated that they had good film-forming property on the air-water interface. The molecular areas for these monolayers at zero pressure were estimated to be 7.2 nm2·mol-1. The collapse pressure of LB film was 46 mN·m-1. Their I~V curves results showed that the title LB films had good electric conductivity and the conductivity of the LB film increased with monolayers number.
Keywords: polyquinolin trilacunary heteropolytungstoilicate Langmuir film and LB film photoelectric properties
 
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靳素荣,柳士忠,张联盟,杜祖亮,赵卫锋.聚喹啉/杂多阴离子杂化LB膜的制备与光电性质[J].无机化学学报,2004,20(5):621-624.
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