微波等离子体化学气相沉积法低温制备直纳米碳管膜
Synthesis of Straight Carbon Nanotube Films by Microwave Plasma Chemical Vapor Deposition at Low Temperature
作者单位
王升高 武汉化工学院等离子体化学与新材料省重点实验室(材料科学与工程系)武汉 430073 
汪建华 武汉化工学院等离子体化学与新材料省重点实验室(材料科学与工程系)武汉 430073 
张保华 武汉化工学院等离子体化学与新材料省重点实验室(材料科学与工程系)武汉 430073 
王传新 中国科学院等离子体物理研究所合肥 220031 
马志斌 武汉化工学院等离子体化学与新材料省重点实验室(材料科学与工程系)武汉 430073 
满卫东 中国科学院等离子体物理研究所合肥 220031 
摘要: 
关键词: 直纳米碳管膜 Fe-Co-Ni合金 微波等离子体化学气相沉积法 低温 镍基板
基金项目: 
Abstract: Among the three main methods for the synthesis of carbon nanotubes (CNTs), chemical vapor deposition (CVD) has received a great deal of attention since CNTs can be synthesized at significantly low temperature. Plasma chemical vapor deposition methods can synthesize CNTs at lower temperature than thermal CVD. But in the usual catalytic growth of CNTs by CVD, CNTs are often tangled together and have some defects. These will limit the property research and potential applications. How to synthesize the straight CNTs at low temperature becomes a challenging issue. In this letter, straight carbon nanotube (CNT) films were achieved by microwave plasma chemical vapor deposition (MWPCVD) catalyzed by round Fe-Co-Ni alloy particles on Ni substrate at 610℃. It was found that, in our experimental condition, the uniform growth rate along the circumference of round alloy particles plays a very important role in the growth of straight CNT films. And because the substrate is conducting, the straight CNT films grown at low temperature may have the benefit for property research and offer the possibility to use them in the future applications.
Keywords: straight carbon nanotube films Fe-Co-Ni alloy microwave plasma chemical vapor deposition low temperature Ni substrate
 
摘要点击次数:  1352
全文下载次数:  1977
王升高,汪建华,张保华,王传新,马志斌,满卫东.微波等离子体化学气相沉积法低温制备直纳米碳管膜[J].无机化学学报,2003,19(3):329-332.
查看全文  查看/发表评论  下载PDF阅读器
Support information: