| XPS、AES研究卤素对铬酸电沉积的活化作用 |
| XPS AND AES STUDIES OF THE ACTIVATION EFFECT OF HALOGEN ON CHROMIUM DEPOSITION IN CHROMIC ACID |
|
| 摘要: 测定了卤素-铬酸-硫酸体系中铬的电沉积效率及阴极极化曲线;XPS、AES测定了该体系中形成的阴极膜的组成。结果表明,硫酸能有效地催化光亮铬的形成,F-、Cl-能显著地提高铬沉积的电流效率;除Br-外,F-、Cl-均参加成膜;膜的深度剖析曲线表明,卤素分布在膜的深层,SO42-集中在膜的表面。由此可推测,F-、Cl- |
| 关键词: XPS AES 铬酸 电沉积 卤素 |
| 基金项目: |
| Abstract: The current efficiency of chromium deposition and cathodic polarlization curves were determined in halogen-chromic acid-sulphuric acid systems. The results show that sulphate is an effective catalyst for the deposition of bright chromium and the current efficiency of the chromium deposition is remarkably increased when F- and Cl- were added to chromic acid. The composition of the cathodic film formed in the systems was determined by XPS and AES. The results show that, except Br-, F- and CF participated in the formation films. The depth profile curves of the film illustrate that halogen is distributed in inner layer of the film, and SO42- in surface layer. It is deduced that F- and Cl- have entered into on the surface of the cathod and formed a bridged complex with reduced chromium dichromate, [CrⅢ-X--CrⅢ], in which electron transition was easily carried out. |
| Keywords: XPS AES chromic acid deposition halogen |
| 投稿时间：1990-11-07 |
| 摘要点击次数: 1952 |
| 全文下载次数: 1926 |
| 方景礼,吴乃钧,王占文.XPS、AES研究卤素对铬酸电沉积的活化作用[J].无机化学学报,1992,8(3):266-271. |
| 查看全文 查看/发表评论 下载PDF阅读器 |
| Support information: |
|
|
|
|
|
|
